Fabrication of Nanophotonic Circuit Components by Thermal Nano Imprint Lithography

Stijn Scheerlinck; Rasmus Haugstrup Pedersen; Pieter Dumon; Wim Bogaerts; Ulrich Plachetka; Dries Van Thourhout; Roel Baets; Anders Kristensen

Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
OSA Technical Digest (CD) (Optica Publishing Group, 2008),
paper CFO2

Fabrication of Nanophotonic Circuit Components by Thermal Nano Imprint Lithography

Stijn Scheerlinck, Rasmus Haugstrup Pedersen, Pieter Dumon, Wim Bogaerts, Ulrich Plachetka, Dries Van Thourhout, Roel Baets, and Anders Kristensen

Conference on Lasers and Electro-Optics 2008

San Jose, California United States
4–9 May 2008
ISBN: 978-1-55752-859-9

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Nano Fabrication Techniques and Novel Material (CFO)

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S. Scheerlinck, R. H. Pedersen, P. Dumon, W. Bogaerts, U. Plachetka, D. Van Thourhout, R. Baets, and A. Kristensen, "Fabrication of Nanophotonic Circuit Components by Thermal Nano Imprint Lithography," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest (CD) (Optica Publishing Group, 2008), paper CFO2.

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Abstract

Nanophotonic components are fabricated using thermal nano imprint lithography (NIL). A silicon-on-insulator Mach-Zehnder interferometer with 20 dB extinction ratio is demonstrated. Grating couplers fabricated by a two-step imprint process demonstrate over 14% coupling efficiency.

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