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Conferences > CLEO > 2007 > JTuA > JTuA17
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • OSA Technical Digest Series (CD) (Optica Publishing Group, 2007),
  • paper JTuA17

Is entanglement dispensable in quantum lithography?

Milena D’Angelo, G. Scarcelli, and Yanhua Shih

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Abstract

Can classical light simulate the effect of quantum lithography? The analysis of the two- photon image generated both by entangled two-photon and by chaotic radiation indicates that only entanglement can double the resolution of an image.

© 2007 Optical Society of America

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