Photonic Band Gap Synthesis by Optical Phase Mask Lithography

Timothy Y.M. Chan; Ovidiu Toader; Sajeev John

Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
OSA Technical Digest Series (CD) (Optica Publishing Group, 2007),
paper CThW5

Photonic Band Gap Synthesis by Optical Phase Mask Lithography

Timothy Y.M. Chan, Ovidiu Toader, and Sajeev John

Conference on Lasers and Electro-Optics 2007

Baltimore, Maryland United States
6–11 May 2007
ISBN: 1557528349

From the session
Fabrication of Periodic Nanostructures (CThW)

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T. Y. M. Chan, O. Toader, and S. John, "Photonic Band Gap Synthesis by Optical Phase Mask Lithography," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest Series (CD) (Optica Publishing Group, 2007), paper CThW5.

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Abstract

We provide a simple and efficient approach for fabricating diamond architecture photonic crystals using single-exposure, single-beam, optical interference lithography based on diffraction of light through an optical phase mask.

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