Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > CLEO > 2006 > JTuD > JTuD47
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • Technical Digest (CD) (Optica Publishing Group, 2006),
  • paper JTuD47

Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etchings method

Daihei Hippo, Yoshiyuki Kawata, Yoshishige Tsuchiya, Hiroshi Mizuta, Shunri Oda, Kei Urakawa, and Nobuyoshi Koshida

Not Accessible

Your library or personal account may give you access

Abstract

We have reported periodic pore formation with diameter in 80nm and aspect ratio above 250 on N+(100) silicon substrate and demonstrated the fabrication of silicon 3-dimensional micro structures by applying double directional etchings method.

© 2006 Optical Society of America

PDF Article
More Like This
3D-2D-3D Photonic Crystal Heterostructures by Direct Laser Writing

Markus Deubel, Martin Wegener, Sajeev John, Stefan Linden, and Georg von Freymann
CTuAA1 Conference on Lasers and Electro-Optics (CLEO:S&I) 2006

Optimization of diffractive elements for fabricating 3-D photonic crystals with interference lithography

Markus E. Testorf, Thomas J. Suleski, and Yi-Chen Chuang
NWA5 Nanophotonics (NANO) 2006

Two-Dimensional Porous Silicon Photonic Crystal Light Emitters

Maria Makarova, Jelena Vuckovic, Hiroyuki Sanda, and Yoshio Nishi
CFI5 Conference on Lasers and Electro-Optics (CLEO:S&I) 2006

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use