Abstract
We have reported periodic pore formation with diameter in 80nm and aspect ratio above 250 on N+(100) silicon substrate and demonstrated the fabrication of silicon 3-dimensional micro structures by applying double directional etchings method.
© 2006 Optical Society of America
PDF ArticleMore Like This
Markus Deubel, Martin Wegener, Sajeev John, Stefan Linden, and Georg von Freymann
CTuAA1 Conference on Lasers and Electro-Optics (CLEO:S&I) 2006
Markus E. Testorf, Thomas J. Suleski, and Yi-Chen Chuang
NWA5 Nanophotonics (NANO) 2006
Maria Makarova, Jelena Vuckovic, Hiroyuki Sanda, and Yoshio Nishi
CFI5 Conference on Lasers and Electro-Optics (CLEO:S&I) 2006