The first experimental results of machining indium tin oxide thin films with the 157nm F2 laser are reported. A low 0.27-J/cm2 ablation threshold and stoichiometric removal enable electrode patterning for biochip applications.
© 2006 Optical Society of America
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
Login to access OSA Member Subscription