Abstract

Laser-plasma-produced EUV-radiation has been demonstrated using a pulsed fiber laser. Generated radiation is in the spectral range compatible with 13.5-nm EUV lithography. Fiber lasers can overcome power-scaling limitations of current LPP sources for EUV lithography.

© 2005 Optical Society of America

PDF Article
More Like This
Efficient 13.5 nm EUV generation from a laser plasma

M. Richardson, C-S Koay, K Takenoshita, S. George, R. Bernath, M.M. Al-Rabban, and V. Bakshi
JThG2 Conference on Lasers and Electro-Optics (CLEO) 2005

High Power Lasers for Generation of EUV Light

Vivek Bakshi
PThB4 Photonic Applications Systems Technologies Conference (PhAST) 2007

Laser-Produced Plasma EUV Sources

Harry Shields, Richard H. Moyer, Fernando Martos, Stuart McNaught, Randall Pierre, Steven W. Fornaca, and Mark Michaelian
TuD2 Frontiers in Optics (FiO) 2003

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription