High-resolution EUV imaging using high harmonic generation

Ariel R. Libertun; Xiaoshi Zhang; Ariel Paul; Daisy Raymondson; Erez Gershgoren; Etienne Gagnon; Sterling Backus; Margaret M. Murnane; Henry C. Kapteyn; Randy A. Bartels; Yanwei Liu; David T. Attwood

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Conference on Lasers and Electro-Optics 2004

San Francisco, California United States
16–21 May 2004
ISBN: 1-55752-770-9

From the session
Coherent XUV Generation and Applications (JMD)

High-resolution EUV imaging using high harmonic generation

Ariel R. Libertun, Xiaoshi Zhang, Ariel Paul, Daisy Raymondson, Erez Gershgoren, Etienne Gagnon, Sterling Backus, Margaret M. Murnane, Henry C. Kapteyn, Randy A. Bartels, Yanwei Liu, and David T. Attwood

Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies
Technical Digest (CD) (Optical Society of America, 2004),
paper JMD4

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A. R. Libertun, X. Zhang, A. Paul, D. Raymondson, E. Gershgoren, E. Gagnon, S. Backus, M. M. Murnane, H. C. Kapteyn, R. A. Bartels, Y. Liu, and D. T. Attwood, "High-resolution EUV imaging using high harmonic generation," in Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2004), paper JMD4.

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Related Topics
Optics & Photonics Topics
?

The topics in this list come from the OSA Optics and Photonics Topics applied to this article.
- Extreme ultraviolet
- High harmonic generation
Previously assigned OCIS codes
- Microscopy (180.0180)
- X-ray microscopy (180.7460)
- X-ray optics (340.0340)
- X-ray imaging (340.7440)

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Abstract

We use a simple set-up consisting of two multilayer mirrors and a hollow fiber EUV light source to obtain high-resolution EUV images. Magnifications of X20 and X50 are demonstrated.

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Abstract

Conference on Lasers and Electro-Optics 2004

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