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  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference
  • Technical Digest (Optica Publishing Group, 2003),
  • paper CFF4

Femtosecond pulsed laser deposition of Si on Si(100)

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Abstract

Femtosecond pulsed laser deposition of Si(100) homoepitaxy is studied by in-situ reflection high-energy electron diffraction and ex-situ atomic force microscopy. Step flow occurs on the reconstructed Si(100)-2×1, while Volmer-Weber growth occurs on the non-reconstructed surface. ©2003 Optical Society of America

© 2003 Optical Society of America

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