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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 2002),
  • paper CMW1

EUV Photoelectron Micro-Spectroscopy with a Laser-Produced Plasma Source

Open Access Open Access

Abstract

A photoelectron spectroscopy with sub-micron resolution is strongly desired for analyzing electronic states of nm-devices and materials. In order to compensate for smaller photon flux focused in a smaller pixel in higher spatial resolution observation, the most important issue in realizing an in-house size system is to achieve high efficiencies in monochromatizing excitation photons and in analyzing electron energies. In the Tomie-type photoelectron spectroscopy, EUPS (EUV photoelectron spectroscopy), a laser-produced plasma emitting discrete emission lines is employed as an EUV source and single narrow band line is selected using a filter with a high transmission. The electron energy spectrum is analyzed in time-of-flight (TOF) method, in which all electrons can be collected theoretically. Thus, high efficiencies in monochromatizing excitation photons and in analyzing electron energies should be realized.

© 2002 Optical Society of America

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