Generation of 0.336-J, 10.Hz, 266-nm Pulses from Nd:YAG Laser Using Large Li2B4O7 Nonllnear Crystals

Yuji Suzuki; Shingo Ono; Hidetoshi Murakami; Toshimasa Kouki; Hideyuki Ohtake; Nobuhiko Sarukiira; Genta Masada; Hiroyuki Shiraishi; Ichiro Sekine

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2002),
paper CFE5

Generation of 0.336-J, 10.Hz, 266-nm Pulses from Nd:YAG Laser Using Large Li₂B₄O₇ Nonllnear Crystals

Yuji Suzuki, Shingo Ono, Hidetoshi Murakami, Toshimasa Kouki, Hideyuki Ohtake, Nobuhiko Sarukiira, Genta Masada, Hiroyuki Shiraishi, and Ichiro Sekine

Conference on Lasers and Electro-Optics 2002

Long Beach, California United States
19–22 May 2002
ISBN: 1-55752-706-7

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Nonlinear Optical Materials (CFE)

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Y. Suzuki, S. Ono, H. Murakami, T. Kouki, H. Ohtake, N. Sarukiira, G. Masada, H. Shiraishi, and I. Sekine, "Generation of 0.336-J, 10.Hz, 266-nm Pulses from Nd:YAG Laser Using Large Li2B4O7 Nonllnear Crystals," in Conference on Lasers and Electro-Optics, M. Fejer, F. Leonberger, J. Fujimoto, and S. Newton, eds., OSA Technical Digest (Optica Publishing Group, 2002), paper CFE5.

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Abstract

Efficient generation of high-pulse-energy ultraviolet (UV) pulses is still matter of interest and even becoming more important for some material processing applications including thin film glass annealing. Still KrF excimer lasers with high running cost are only reliable light source in this category.

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