Fabrication of Nanostructures with Interferometric Lithography

David Burckel; Shuang Zhang; S.R.J. Brueck

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2001),
paper CTuT1

Fabrication of Nanostructures with Interferometric Lithography

David Burckel, Shuang Zhang, and S.R.J. Brueck

Conference on Lasers and Electro-Optics 2001

Baltimore, Maryland United States
6–10 May 2001
ISBN: 1-55752-662-1

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Laser Processing (CTuT)

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D. Burckel, S. Zhang, and S. R. J. Brueck, "Fabrication of Nanostructures with Interferometric Lithography," in Conference on Lasers and Electro-Optics, J. Kafka, K. Vahala, R. Williamson, and A. Willner, eds., OSA Technical Digest (Optica Publishing Group, 2001), paper CTuT1.

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Abstract

Nanostructures, features with characteristic dimensions between 1- and 100-nm, are the focus of much current attention as a result of the unique physical properties offered in this mesoscopic regime.

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