Absorption Monitoring and Optical Damage Protection for Micromechanical Optics

R. N. Supino; J. J. Talghader

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2001),
paper CTuL4

Absorption Monitoring and Optical Damage Protection for Micromechanical Optics

R. N. Supino and J. J. Talghader

Conference on Lasers and Electro-Optics 2001

Baltimore, Maryland United States
6–10 May 2001
ISBN: 1-55752-662-1

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Optical MEM's (CTuL)

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R. N. Supino and J. J. Talghader, "Absorption Monitoring and Optical Damage Protection for Micromechanical Optics," in Conference on Lasers and Electro-Optics, J. Kafka, K. Vahala, R. Williamson, and A. Willner, eds., OSA Technical Digest (Optica Publishing Group, 2001), paper CTuL4.

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Abstract

It is critically important to understand the absorption characteristics of micromachined optical devices.

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