Photosensitivity in glasses: comparing ultrafast lasers with vacuum-ultraviolet lasers

Peter R. Herman; Kevin P. Chen; Sandy Ng; Jie Zhang; Dragan Coric; Paul Corkum; Paul Corkum; Manjusha Mehendale; Manjusha Mehendale; Andrei Naumov; Andrei Naumov; David Rayner; David Rayner

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2001),
paper CThM5

Photosensitivity in glasses: comparing ultrafast lasers with vacuum-ultraviolet lasers

Peter R. Herman, Kevin P. Chen, Sandy Ng, Jie Zhang, Dragan Coric, Paul Corkum, Manjusha Mehendale, Andrei Naumov, and David Rayner

Conference on Lasers and Electro-Optics 2001

Baltimore, Maryland United States
6–10 May 2001
ISBN: 1-55752-662-1

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High Fields and Plasmas (CThM)

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P. R. Herman, K. P. Chen, S. Ng, J. Zhang, D. Coric, P. Corkum, M. Mehendale, A. Naumov, and D. Rayner, "Photosensitivity in glasses: comparing ultrafast lasers with vacuum-ultraviolet lasers," in Conference on Lasers and Electro-Optics, J. Kafka, K. Vahala, R. Williamson, and A. Willner, eds., OSA Technical Digest (Optica Publishing Group, 2001), paper CThM5.

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Abstract

One forefront of optical Communications is a race to develop new processing and packaging technologies that can miniaturize and integrate optical devices into highly functional optical circuits, an effort analogous with the miniaturization and integration of electronic components onto semiconductor chips more than four decades ago.

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