Abstract
We review the salient aspects of nanoimprinting, nanoembossing and molding for optical device fabrication and report on our study of nanoimprint lithography oriented towards the fabrication of waveguides and MSM detectors. The driving force is the possibility to use this parallel fabrication approach to make integrated optical devices in planar geometry, which, in some parts, exhibit a higher resolution than optical lithography.
© 2000 Optical Society of America
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