Light induced frustration of etching in Fe doped LiNbO3

Ian E. Barry; Robert W. Eason; Robert W. Eason; Gary Cook; Gary Cook

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1999),
paper CThH3

Light induced frustration of etching in Fe doped LiNbO₃

Ian E. Barry, Robert W. Eason, and Gary Cook

Conference on Lasers and Electro-Optics 1999

Baltimore, Maryland United States
23–26 May 1999
ISBN: 1-55752-570-6

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Laser Micromachining (CThH)

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I. E. Barry, R. W. Eason, and G. Cook, "Light induced frustration of etching in Fe doped LiNbO3," in Conference on Lasers and Electro-Optics, C. Chang-Hasnain, W. Knox, J. Kafka, and K. Vahala, eds., OSA Technical Digest (Optica Publishing Group, 1999), paper CThH3.

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Abstract

There is considerable interest in etching, structuring, and patterning a wide range of insulators, dielectrics, and semiconductors, for microelectronic and microphotonic device applications.

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