Non-thermal and thermal processes in the ultra-short laser ablation of sapphire

R. Stoian; M. Lorenz; D. Ashkenasi; A. Rosenfeld; E.E.B. Campbell; E.E.B. Campbell

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1999),
paper CThC1

Non-thermal and thermal processes in the ultra-short laser ablation of sapphire

R. Stoian, M. Lorenz, D. Ashkenasi, A. Rosenfeld, and E.E.B. Campbell

Conference on Lasers and Electro-Optics 1999

Baltimore, Maryland United States
23–26 May 1999
ISBN: 1-55752-570-6

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Ultrafast Laser Material Modification (CThC)

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R. Stoian, M. Lorenz, D. Ashkenasi, A. Rosenfeld, and E. E. B. Campbell, "Non-thermal and thermal processes in the ultra-short laser ablation of sapphire," in Conference on Lasers and Electro-Optics, C. Chang-Hasnain, W. Knox, J. Kafka, and K. Vahala, eds., OSA Technical Digest (Optica Publishing Group, 1999), paper CThC1.

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Abstract

The purpose of this study is to distinguish between non-thermal and thermal processes that lead to laser ablation of wide band-gap dielectrics (in our case sapphire) under ultrashort (sub-ps and ps) infrared laser pulses irradiation.

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