Processing wide-bandgap optical materials with 157nm F2 laser radiation

Peter K. Herman; Kou Kurosawa; Takayuki Yamanishi; Brian Jackson; Jianhao Yang

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1997),
paper CTuK3

Processing wide-bandgap optical materials with 157nm F₂ laser radiation

Peter K. Herman, Kou Kurosawa, Takayuki Yamanishi, Brian Jackson, and Jianhao Yang

Conference on Lasers and Electro-Optics 1997

Baltimore, Maryland United States
18–23 May 1997
ISBN: 1-55752-498-8

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Nanoscale Material Processing (CTuK)

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P. K. Herman, K. Kurosawa, T. Yamanishi, B. Jackson, and J. Yang, "Processing wide-bandgap optical materials with 157nm F2 laser radiation," in Conference on Lasers and Electro-Optics, D. Killinger, G. Valley, C. Chang-Hasnain, and W. Knox, eds., Vol. 11 of OSA Technical Digest (Optica Publishing Group, 1997), paper CTuK3.

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Abstract

Laser micromachining of optical materials is attractive for numerous applications in shaping optical surfaces of lenses, fabricating optical interconnects, printing diffractive optics, and repairing photonic circuits.

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