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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1996),
  • paper CThK46

Research on the ablation characteristics and increasement of electrical conductivity of C60 film by 308-nm excimer laser

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Abstract

Direct photoetching or ablation of some materials by pulsed ultraviolet excimer laser and the feasibility of using this "dry" lithography in microelectronics now promotes wide research. To date, most studies in this field focus on organic polymer. As a direct-gap semiconductor, because of some unusual properties derived from its unique football-like molecular structure, C60 material may greatly influence the development of the semiconductor industry.

© 1996 Optical Society of America

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