Abstract
Conduction type in Si-doped GaAs and A1GaAs layers grown on (N11)A GaAs (N<3) can be controlled using molecular-beam epitaxy (MBE) growth conditions and surface orientations.1 Therefore, lateral p-n junctions of Si-doped GaAs can be formed at the intersection between the (111)A plane and the high-index plane on the patterned substrates.
© 1993 Optical Society of America
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