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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1993),
  • paper CTuN100

VUV radiation from excimer laser-generated plasmas: the effects of gas ambients on plasma characteristics

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Abstract

Radiation from plasma generated by a KrF excimer laser (248 nm) has been collected in the vacuum ultraviolet range (120 - 300 nm), both in a vacuum and in oxygen pressures of up to 300 mTorr, Plasmas were generated by focussing the Laser pulse (~2 J/cm2) onto a rotating YBa2Cu3O7 target in a chamber connected directly to a VUV spectrograph. Characterization of the ablated plume constituents from their measured radiated intensity is an important diagnostic to infer plasma properties, such as degree of ionization, density, temperature, and spatial distribution. It is thought that plasma spatial characterization will lead to improvements in film growth by pulsed laser deposition.

© 1993 Optical Society of America

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