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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1990),
  • paper CWL5

Probing incubation pulses in excimer laser ablation of PMMA by fast (<1-ns) imaging and chemical analysis

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Abstract

In the practice of using UV laser pulses to ablate and etch polymers, the term incubation pulses1,2 has come to mean the first few pulses at a given fluence that are required to condition the surface before a single pulse gives rise to a reproducible etch depth. The phenomenon is readily seen in polymers with weak absorption at a given wavelength and even in tissue (e.g., in the cornea) in the same conditions. The explanation for this phenomenon1 was based exclusively on etch depth measurements and, therefore, subject to the uncertainty in measuring the depths of shallow holes.

© 1990 Optical Society of America

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