Abstract

Laser-induced chemical vapor deposition (CVD) has been extensively studied for manufacturing process simplification, because this technique allows selective deposition only in the irradiated area. Such laser-induced CVD has long been desired in microdevice fabrication. We propose here the application of this laser-induced direct patterning technology to the manufacture of large area liquid crystal displays (LCDs). An LCD substrate consists of a thin film transistor (TFT) matrix and its interconnections. The required spatial resolution is 1-2 orders of magnitude lower than that in the usual submicron scale LSI fabrication. Hence the spatial resolution poses no difficulty in this application. The step and repeat projection printing scheme is expected to cover the entire area of the large substrate.

© 1989 Optical Society of America