Abstract

Discharge-excited KrF excimer lasers with high repetition rates have several uses, such as lithography and epitaxy for next generation semiconductor processes. Several discharge-excited excimer lasers are on the market; however, from such KrF excimer lasers, the average power over 100 W and the high repetition rate over 500 Hz are not likely to be obtainable simultaneously. Moreover, gas lifetime of these lasers is not longer than ~1.5 × 106 shots.

© 1988 Optical Society of America

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