Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > CLEO > 1988 > MB > MB5
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1988),
  • paper MB5

Narrow-linewidth 1.3-μm DFB-DCPBH lasers with λ/4-shifted first-order gratings fabricated by electron-beam lithography using a new fast resist

C. E. ZAH, C. CANEAU, S. G. MENOCAL, P. S. D. LIN, A. S. GOZDZ, F. FAVIRE, and T. P. LEE

Not Accessible

Your library or personal account may give you access

Abstract

Electron-beam lithography has significant advantages over the optical interference lithography in making gratings for DFB lasers.1 Until now firstorder gratings generated by e-beam lithography have been used to fabricate 1.5-μm DFB ridge- waveguide lasers,2 which are weakly index-guided. For narrow linewidth, we chose the strongly index-guided double-channel planar buried heterostructure (DCPBH).3

© 1988 Optical Society of America

PDF Article
More Like This
Performance of 1.5-μm λ/4-shifted DFB-SIPBH laser diodes with electron-beam-defined and reactive ion etched gratings

C. E. ZAH, C. CANEAU, S. G. MENOCAL, A. S. GOZDZ, P. S. D. LIN, F. FAVIRE, A. YI-YAN, T. P. LEE, A. G. DENTAI, and C. H. JOYNER
WB5 Optical Fiber Communication Conference (OFC) 1989

High-efficiency and high-speed operation in 1.55-μm λ/4-shifted DFB-DC-PBH LD with a new window structure

M. YAMAGUCHI, S. TAKANO, S. FUJITA, T. NUMAI, IKUO MITO, and K. KOBAYA-SHI
ThK4 Optical Fiber Communication Conference (OFC) 1988

GaAs/GaAIAs Distributed Bragg Reflector Laser with E-Beam-Defined First-Order Gratings

M. C. Wu, S. Wang, Y. H. Lo, P. S. D. Lin, and A. S. Gozdz
CPD12 Conference on Lasers and Electro-Optics (CLEO:S&I) 1988

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use