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Channelled Substrate Buried Heterostructure InGaAsP/InP Laser with Fe-Doped Semi-Insulating InP Base Structure for 1.7 Gb/s Optical Communication Systems

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Abstract

A common problem in the fabrication of low threshold buried heterostructure lasers in the InGaAsP/InP material system is the control of leakage current [1], Leakage currents lead to increased threshold current and low differential quantum efficiencies. Typically, the current is designed to be confined to the active stripe by reverse-biased p-n junctions. However, in devices using these blocking junctions, charging and discharging of the junction capacitance limits the frequency response of these devices. This problem can be eliminated by using a high resistivity material as the current blocking layer [2].

© 1986 Optical Society of America

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