Abstract

The chemical vapor deposition (CVD) process is used extensively by industry to produce thin films for microelectronics and for wear/corrosion-resistant film applications. The specific methods for producing such films have been developed empirically, and until recently very little basic research has been done on the fundamental physics and the chemistry of the CVD process. This paper describes a coordinated experimental and theoretical program that investigates the gas phase in CVD in detail.

© 1985 Optical Society of America

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