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Conferences > CLEO > 1984 > THD > THD4

Thermal radiation from laser heated Silicon and pyrometrie temperature

M. Kemmler, G. Wartmann, and D. Von Der Linde

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Abstract

Laser processing of semiconductors promises to provide novel methods of improving and tailoring materials for applications in electronics. Therefore, the basic physical processes involved in laser processing are of great current interest. One fundamental question concerns the redistribution of the laser energy deposited in the irradiated material and the resulting temperature rise.

© 1984 Optical Society of America

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