Abstract
Chemical vapor deposition (CVD) is widely used in the production of microelectronic devices. Despite a great deal of study, a detailed understanding of the deposition mechanism is not available. In particular, the relative importance of surface and gas-phase reactions is not well understood. Laser-based diagnostic techniques, combined with theoretical modeling, can give detailed information about the gas-phase species present during CVD.
© 1983 Optical Society of America
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