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Spatial period division using an ArF laser

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Abstract

Spatial period division1-3 is a lithographic technique in which a pattern of spatial period P/m is exposed by the diffraction field of a mask having a spatial period P. We have used an ArF laser (λ= 193 nm) and a mask of spatial period 199 nm to expose a 99.5-nm period grating pattern in PMMA.

© 1982 Optical Society of America

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