Microoptical spatial filtering for optical inspection

P. Cielo; J. Lapierre

doi:10.1364/CLEO.1982.THA2

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1982),
paper THA2
•https://doi.org/10.1364/CLEO.1982.THA2

Microoptical spatial filtering for optical inspection

P. Cielo and J. Lapierre

Conference on Lasers and Electro-Optics 1982

Phoenix, Arizona United States
14–16 April 1982
ISBN:

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Laser Metrology (THA)

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P. Cielo and J. Lapierre, "Microoptical spatial filtering for optical inspection," in Conference on Lasers and Electro-Optics, R. Abrams and A. Guenther, eds., OSA Technical Digest (Optica Publishing Group, 1982), paper THA2.

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Abstract

The inspection of surfaces is an important aspect of nondestructive evaluation of industrial materials. Optical inspection methods are preferable to other methods, such as liquid penetrants or eddy-current techniques, because of their rapidity, noncontact nature, and ease of scanning, which make optical techniques particularly suitable to automatic detection of surface characteristics. The basic problems faced by optical inspection systems are related to surface scattering properties, speckle, alignment considerations, and changes in surface reflectivity.¹

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