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Laser annealing with a 308-nm Xe-CI pulsed escimer laser

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Abstract

High-power pulsed excimer laser systems are finding increasing use because they are a relatively efficient and inexpensive source of high-energy photons. Materials processing results using such lasers might be expected to differ from those produced by normal, visible, and IR lasers when the high photon energy and beam uniformity are important.

© 1981 Optical Society of America

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