Abstract
Laser processing has several potential advantages for semiconductor device processing. The advantages impact both conventional processes for VLSI devices and unique material combinations for novel device structures. Although the fabrication of novel devices has received considerable publicity, efforts in this area must deal with very complex nonequilibrium processes and require considerable more work. Applications to conventional processes can be reduced to more isolated problems and will be the first to be exploited.
© 1981 Optical Society of America
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