Why the χ(3) of silica increases after poling

Raman Kashyap

doi:10.1364/BGPP.2003.PD5

Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides
Technical Digest (Optica Publishing Group, 2003),
paper PD5
•https://doi.org/10.1364/BGPP.2003.PD5

Why the χ⁽³⁾ of silica increases after poling

Raman Kashyap

Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides 2003

Monterey, California United States
1–3 September 2003
ISBN: 1-55752-736-9

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R. Kashyap, "Why the χ(3) of silica increases after poling," in Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, Technical Digest (Optica Publishing Group, 2003), paper PD5.

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Abstract

This paper demonstrates how the Lorentz local field corrections explain the step-like increase by a factor of 1.98 or more in the third order susceptibility of glass after thermal poling.

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