Resonance transition 795-nm Rubidium laser using 3He buffer gas

Sheldon S.Q. Wu; Sheldon S.Q. Wu; Thomas F. Soules; Ralph H. Page; Scott C. Mitchell; V. Keith Kanz; Raymond J. Beach

doi:10.1364/ASSP.2008.WB2

Advanced Solid-State Photonics
OSA Technical Digest Series (CD) (Optica Publishing Group, 2008),
paper WB2
•https://doi.org/10.1364/ASSP.2008.WB2

Resonance transition 795-nm Rubidium laser using ³He buffer gas

Sheldon S.Q. Wu, Thomas F. Soules, Ralph H. Page, Scott C. Mitchell, V. Keith Kanz, and Raymond J. Beach

Advanced Solid-State Photonics 2008

Nara Japan
27–30 January 2008
ISBN: 1-55752-850-0

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Poster Session II (Student) (WB)

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S. S. Q. Wu, T. F. Soules, R. H. Page, S. C. Mitchell, V. K. Kanz, and R. J. Beach, "Resonance transition 795-nm Rubidium laser using 3He buffer gas," in Advanced Solid-State Photonics, OSA Technical Digest Series (CD) (Optica Publishing Group, 2008), paper WB2.

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Abstract

Demonstration of 795-nm Rubidium laser using a buffer gas consisting of pure ³He is reported. The use of ³He yields enhanced mixing of the Rb fine-structure levels and enables efficient lasing at reduced buffer gas pressures.

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