OPA Based Compact 193 nm Light Source for Hybrid ArF Laser

Chen Qu; Yohei Tanaka; Hironori Igarashi; Yuki Tamaru; Atsushi Fuchimukai; Yoshihiko Murakami; Taisuke Miura; Kouji Kakizaki

doi:10.1364/ASSL.2020.JTh6A.2

Laser Congress 2020 (ASSL, LAC)
OSA Technical Digest (Optica Publishing Group, 2020),
paper JTh6A.2
•https://doi.org/10.1364/ASSL.2020.JTh6A.2

OPA Based Compact 193 nm Light Source for Hybrid ArF Laser

Chen Qu, Yohei Tanaka, Hironori Igarashi, Yuki Tamaru, Atsushi Fuchimukai, Yoshihiko Murakami, Taisuke Miura, and Kouji Kakizaki

Advanced Solid State Lasers 2020

Washington, D.C. United States
13–16 October 2020
ISBN: 978-1-943580-84-2

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Joint Poster Session III (JTh6A)

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C. Qu, Y. Tanaka, H. Igarashi, Y. Tamaru, A. Fuchimukai, Y. Murakami, T. Miura, and K. Kakizaki, "OPA Based Compact 193 nm Light Source for Hybrid ArF Laser," in Laser Congress 2020 (ASSL, LAC), P. Schunemann, C. Saraceno, S. Mirov, S. Taccheo, J. Nilsson, A. Petersen, D. Mordaunt, and J. Trbola, eds., OSA Technical Digest (Optica Publishing Group, 2020), paper JTh6A.2.

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Abstract

We report a 193 nm solid state laser based on 1030 nm laser and 1550 nm laser which is generated by two-stage OPA. 110 mW output power and 0.5 pm spectral width was achieved.

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