Sub-20 fs high-energy pulse generation at 515 nm with 50 W of average power

Robert Klas; Robert Klas; Joachim Buldt; Henning Stark; Alexander Kirsche; Alexander Kirsche; Martin Gebhardt; Martin Gebhardt; Jan Rothhardt; Jan Rothhardt; Jan Rothhardt; Jens Limpert; Jens Limpert; Jens Limpert

doi:10.1364/ASSL.2020.AF3A.4

Laser Congress 2020 (ASSL, LAC)
OSA Technical Digest (Optica Publishing Group, 2020),
paper AF3A.4
•https://doi.org/10.1364/ASSL.2020.AF3A.4

Sub-20 fs high-energy pulse generation at 515 nm with 50 W of average power

Robert Klas, Joachim Buldt, Henning Stark, Alexander Kirsche, Martin Gebhardt, Jan Rothhardt, and Jens Limpert

Advanced Solid State Lasers 2020

Washington, D.C. United States
13–16 October 2020
ISBN: 978-1-943580-84-2

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XUV, UV and Nonlinear Conversion (AF3A)

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R. Klas, J. Buldt, H. Stark, A. Kirsche, M. Gebhardt, J. Rothhardt, and J. Limpert, "Sub-20 fs high-energy pulse generation at 515 nm with 50 W of average power," in Laser Congress 2020 (ASSL, LAC), P. Schunemann, C. Saraceno, S. Mirov, S. Taccheo, J. Nilsson, A. Petersen, D. Mordaunt, and J. Trbola, eds., OSA Technical Digest (Optica Publishing Group, 2020), paper AF3A.4.

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Abstract

A nonlinear compression of 515 nm pulses resulting in 17.8 fs-, 50 µJ-pulses at 1 MHz, 50 W average power and near diffraction limited beam quality is presented.

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