Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Adaptive Optics: Analysis and Methods/Computational Optical Sensing and Imaging/Information Photonics/Signal Recovery and Synthesis Topical Meetings on CD-ROM
  • Technical Digest (Optica Publishing Group, 2005),
  • paper JWB10
  • https://doi.org/10.1364/AOPT.2005.JWB10

Parallel Fabrication of Photonic Crystals (PC) using Interference Lithography for Integrated Waveguide-PC Devices

Not Accessible

Your library or personal account may give you access

Abstract

Multiple exposure interference lithography is a promising way to fabricate areas of photonic crystals areas lithographically mapped for easy integration with conventional waveguides or optical devices. Preliminary results on fabrication of square PCs are reported.

© 2005 Optical Society of America

PDF Article
More Like This
Simulation of Photonic-Crystal Devices Fabricated via Pattern-Integrated Interference Lithography

Matthieu C. R. Leibovici and Thomas K. Gaylord
FW1F.5 Frontiers in Optics (FiO) 2013

Simulation of Photonic-Crystal Devices Fabricated by Pattern-Integrated Interference Lithography

Matthieu C. R. Leibovici and Thomas K. Gaylord
FW1A.6 Frontiers in Optics (FiO) 2014

Integrated Photonic Devices: Wavelength switching by mode interference between photonic crystal channel waveguides

S. Mahnkopf, M.E. Zoorob, M. Kamp, A. Forchel, T.D.M. Lee, M.D.B. Charlton, and R. März
FThF1 Frontiers in Optics (FiO) 2005

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved