Abstract

Metrology holograms are critical for interferometric testing of precision aspheric and free-form surfaces with low uncertainty. We describe a new facility for fabrication and research of metrology holograms at NIST. A high-performance photo-lithography tool enables the efficient fabrication of large diffractive and subwavelength nano-structured optics with multiple phase levels and line widths down to 200 nm.

© 2012 Optical Society of America

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