InP nano inner cladding fiber was fabricated by the means of MCVD. The thickness of the InP film is about 60nm. The electric field distribution is simulated through the FEM. It is shown that the InP nano film can confine the electric distribution in the core and the n<sup>eff</sup>=1.585.
© OSA, IEEE Photonics Society, SPIE, COS, CICPDF Article