Abstract

A GaN surface-grating reflector has been designed and fabricated. The grating structure was optimized by the rigorous coupled-wave analysis, which was followed by the fabrication using holographic lithography. Reflectance measurements revealed that the grating was highly polarization-dependent, its reflectance exceeding 90% over the spectral bandwidth of 60 nm for TE-polarization.

© OSA, IEEE Photonics Society, SPIE, COS, CIC

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