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Conferences > ACP > 2009 > ThG > ThG1

A Study on the Cl2/C2H4/Ar Plasma Etching of ITO Using Inductively Coupled Plasma

Rong Fang, Xia Guo, Wen Jing Jiang, Yu Han Guo, Yuan Qin, Guang Di Shen, and Jin Ru Han

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Abstract

In this study, the indium tin oxide (ITO) was etched by an inductively coupled plasma (ICP) etcher using Cl2/C2H4/Ar as the etching gases. A detailed study on the samples etched in different parameters was performed.

© 2009 OSA, IEEE Photonics Society, SPIE, COS, CIC

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