Here we demonstrate a new highly-controllable method for fabricating high-quality, air-stable phosphorene films with a designated number of layers ranging from a few- down to a mono-layer. Our approach involves the use of oxygen plasma etching to thin-down thick phosphorene flakes with atomic precision. During the etching process a phosphorus oxide capping layer is formed which acts as a protective coating to lead phosphorene stable in ambient conditions.

© 2016 Optical Society of America

PDF Article
More Like This
Preparation of Few-layer Black Phosphorus with Enhanced Photoluminescence and Stability

Dongying Li, Yueyang Yu, and Cun-Zheng Ning
SW4F.8 CLEO: Science and Innovations (CLEO_SI) 2020

Near Infrared Emission from Defect States of Atomically Thin Phosphorene

Shahriar Aghaeimeibodi, Je-Hyung Kim, and Edo Waks
SW4K.4 CLEO: Science and Innovations (CLEO_SI) 2017

Nonlinear Optical Responses of Protected Atomically Thin Black Phosphorus

Takaaki Harada, Bryan Berggren, Skylar Deckoff-Jones, Dylan L. Renaud, Andrew Winchester, Julien Madéo, Christopher Weber, and Keshav M. Dani
FTu4L.8 CLEO: QELS_Fundamental Science (CLEO_QELS) 2016


You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access Optica Member Subscription