Abstract

Here we demonstrate a new highly-controllable method for fabricating high-quality, air-stable phosphorene films with a designated number of layers ranging from a few- down to a mono-layer. Our approach involves the use of oxygen plasma etching to thin-down thick phosphorene flakes with atomic precision. During the etching process a phosphorus oxide capping layer is formed which acts as a protective coating to lead phosphorene stable in ambient conditions.

© 2016 Optical Society of America

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