Analysis of Polarization-Dependent Near-Field Optical Effects in Microfabricated Apertureless SNOM Probes

Wataru Nakagawa; Luciana Vaccaro; Emiliano Descrovi; Hans Peter Herzig

doi:10.1364/NPIS.2005.NThA6

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Nanophotonics for Information Systems 2005

San Diego, California United States
13–15 April 2005
ISBN: 1-55752-787-3

From the session
Modeling and Design for Nanophotonics (NThA)

Analysis of Polarization-Dependent Near-Field Optical Effects in Microfabricated Apertureless SNOM Probes

Wataru Nakagawa, Luciana Vaccaro, Emiliano Descrovi, and Hans Peter Herzig

Integrated Photonics Research and Applications/Nanophotonics for Information Systems
Technical Digest (Optical Society of America, 2005),
paper NThA6
•https://doi.org/10.1364/NPIS.2005.NThA6

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W. Nakagawa, L. Vaccaro, E. Descrovi, and H. P. Herzig, "Analysis of Polarization-Dependent Near-Field Optical Effects in Microfabricated Apertureless SNOM Probes," in Integrated Photonics Research and Applications/Nanophotonics for Information Systems, Technical Digest (Optical Society of America, 2005), paper NThA6.

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Abstract

We investigate the influence of single and multiple defects in the metal coating layer of microfabricated apertureless scanning near-field optical microscopy (SNOM) probes on the polarization-dependent emitted optical near field using rigorous electromagnetic modeling tools.

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Nanophotonics for Information Systems 2005

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