Abstract

A flexible illumination system for Talbot lithography is presented, in which the Talbot mask is illuminated by discrete but variable incidence angles. Changing the illumination angle stepwise in combination with different exposure doses for different angles offers the possibility to generate periodic continuous surface relief structures. To demonstrate the capability of this approach, two exemplary micro-optical structures were manufactured. The first example is a blazed grating with a stepsize of 1.5 μm. The second element is a specific beam splitter with parabolic-shaped grating grooves. The quality of the manufacturing process is evaluated on the basis of the optical performance of the resulting micro-optical elements.

© 2014 Optical Society of America

Quantitative analysis of imperfect frequency multiplying in fractional Talbot planes and its effect on high-frequency-grating lithography

Daniel Thomae, Oliver Sandfuchs, and Robert Brunner
J. Opt. Soc. Am. A 31(7) 1436-1444 (2014)

Influence of oblique illumination on perfect Talbot imaging and nearly perfect self-imaging for gratings beyond five diffraction orders

Daniel Thomae, Oliver Sandfuchs, and Robert Brunner
J. Opt. Soc. Am. A 32(12) 2365-2372 (2015)

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Andreas Vetter, Raoul Kirner, Dmitrijs Opalevs, Matthias Scholz, Patrick Leisching, Toralf Scharf, Wilfried Noell, Carsten Rockstuhl, and Reinhard Voelkel
Opt. Express 26(17) 22218-22233 (2018)

Advanced mask aligner lithography: Fabrication of periodic patterns using pinhole array mask and Talbot effect

Lorenz Stuerzebecher, Torsten Harzendorf, Uwe Vogler, Uwe D. Zeitner, and Reinhard Voelkel
Opt. Express 18(19) 19485-19494 (2010)

Extreme ultraviolet Talbot interference lithography

Wei Li and Mario C. Marconi
Opt. Express 23(20) 25532-25538 (2015)