Abstract
We report good phase controllability and high production yield in Si-nanowire-based multistage delayed Mach–Zehnder interferometer-type optical multiplexers/demultiplexers (MUX/DeMUX) fabricated by an ArF-immersion lithography process on a 300 mm silicon-on-insulator (SOI) wafer. Three kinds of devices fabricated in this work exhibit clear wavelength filtering operations for various optical frequency spacing. These results are promising for their applications in high-density wavelength division multiplexing-based optical interconnects.
© 2014 Optical Society of America
Full Article | PDF ArticleMore Like This
Seok-Hwan Jeong and Yu Tanaka
Appl. Opt. 57(22) 6474-6480 (2018)
Seok-Hwan Jeong, Daisuke Shimura, Takasi Simoyama, Miyoshi Seki, Nobuyuki Yokoyama, Minoru Ohtsuka, Keiji Koshino, Tsuyoshi Horikawa, Yu Tanaka, and Ken Morito
Opt. Express 21(25) 30163-30174 (2013)
Seok-Hwan Jeong, Shinsuke Tanaka, Tomoyuki Akiyama, Shigeaki Sekiguchi, Yu Tanaka, and Ken Morito
Opt. Express 20(23) 26000-26011 (2012)