Abstract
We outline a method for accomplishing photolithography on grossly nonplanar substrates. First we compute an approximation of the diffraction pattern that will produce the desired light-intensity distribution on the substrate to be patterned. This pattern is then digitized and converted into a format suitable for manufacture by a direct-write method. The resultant computer-generated hologram mask is then used in a custom alignment tool to expose the photoresist-coated substrate. The technique has many potential applications in the packaging of microelectronics and microelectromechanical systems.
© 2005 Optical Society of America
Full Article | PDF ArticleMore Like This
Victor Arrizón
Opt. Lett. 28(24) 2521-2523 (2003)
Quan-Zhong Zhao, Jian-Rong Qiu, Xiong-Wei Jiang, En-Wen Dai, Chang-He Zhou, and Cong-Shan Zhu
Opt. Express 13(6) 2089-2092 (2005)
Rafael Piestun, Joseph Shamir, Bernhard Weßkamp, and Olof Bryngdahl
Opt. Lett. 22(12) 922-924 (1997)