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Simulation method for resonant light scattering of exciton confined to arbitrary geometry

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Abstract

We develop an electromagnetic (EM) simulation method based on a finite-element method (FEM) for an exciton confined to a semiconductor nanostructure. The EM field inside the semiconductor excites two transverse exciton polariton and a single longitudinal exciton at a given frequency. Established EM simulation methods cannot be applied directly to semiconductor nanostructures because of this multimode excitation; however, the present method overcomes this difficulty by introducing an additional boundary condition. To avoid spurious solutions and enhance the precision, we propose a hybrid edge–nodal element formulation in which edge and nodal elements are employed to represent the transverse and longitudinal polarizations, respectively. We apply the developed method to the EM-field scattering and distributions of exciton polarizations of spherical and hexagonal-disk quantum dots.

© 2014 Optical Society of America

1. Introduction

Numerical methods for the computation of electromagnetic (EM) fields, such as the finite-difference time-domain (FDTD) method [1], finite-element method (FEM) [2], and boundary element method [3], have been developed to analyze the performance and determine the optimal design of various optical devices. The quality factor of a photonic crystal slab cavity, for example, can be significantly improved by designing the cavity structure based on the results of FDTD simulations [4]. Furthermore, these EM-field simulations are of immense benefit in the fascinating research fields of plasmonics and metamaterials.

The interesting optical properties that are found in plasmonics originate from highly intense and strongly localized EM fields mediated by a surface plasmon, and similar optical properties would be expected from exciton resonance. However, established numerical methods are limited to dielectrics and metals, and an EM simulation that takes into account an exciton confined in arbitrary geometry has yet to be developed in a general form. One exception is the extended version of the discrete dipole approximation (DDA) [5], which has been used to study the optical selection-rule breakdown [6] and finite exciton momentum [7] in a carbon nanotube placed in a nanogap between gold nanoparticles. The extended DDA requires advance knowledge of a large number of exciton wavefunctions that account for the electron–hole exchange interaction [8]. In this paper, we present an FEM-based EM simulation method that can be applied to exciton resonance in an arbitrary confinement geometry without needing to calculate exciton wavefunctions.

Excitons are bound states of an optically excited electron–hole pair in a semiconductor and play an important role in the optical properties of semiconductor nanostructures. In fact, the spectral peaks of a nanostructure depend on its size and geometry because of the quantum confinement effect, which arises from the strong dispersion relation between the exciton energy and wave vector.

In contrast to an exciton, the dispersion relation of a plasmon in a metal is negligibly small, i.e., the plasmon energy is almost independent of its wave vector. As a result, there is at most only one plasmon polariton mode in a metal at a given frequency. This means that EM simulation methods can be directly applied to metallic nanostructures by simply using a frequency-dependent dielectric function. For an exciton, however, which has a strong dispersion relation, there can be at most two transverse exciton polariton modes propagating in a semiconductor at a given frequency. In addition, there is one longitudinal exciton mode. The multimode excitations in semiconductor nanostructures mean that the number of boundary conditions for the associated Maxwell’s equations is less than the number of variables (the field amplitudes). To resolve this problem, two methods have been developed: the introduction of an additional boundary condition (ABC) for the exciton polarization [914], and a microscopic nonlocal theory [15,16] in which the exciton polarization and EM field are determined self-consistently. We adopt the ABC in our FEM-based EM simulations.

The EM simulation method proposed here for a confined exciton has been developed for one-and two-dimensional (1D and 2D) systems with the ABC [17]. The method can be applied to the limiting case in which the longitudinal component of the exciton is not excited by incident light polarized in a direction parallel to the semiconductor surface (S polarization), and cannot be applied for P polarized incident light even for 1D and 2D systems. For a three-dimensional arbitrary confinement geometry, the longitudinal component of the exciton arises in general; for the exciton in a spherical quantum dot (QD), for example, the longitudinal and transverse mixed mode is strongly coupled to a plane-wave EM field when the size of the sphere is much smaller than the wavelength of the EM field [18]. The present FEM-based EM simulation method can also be applied to the general case in which the longitudinal component of the exciton is excited.

2. Variational formulation

Maxwell’s equations lead to vector wave equations (Maxwell’s wave equations) for the electric and magnetic fields and the boundary conditions at the interface of materials with different permittivities or permeabilities. This boundary-value problem can be formulated using a functional , and the stationary condition of the functional δℱ = 0 provides the governing Maxwell’s wave equations and Neumann boundary conditions.

2.1. Electromagnetic field modes

We consider a situation in which an incident field E(inc) irradiates a semiconductor nanostructure (region Ω1) surrounded by a dielectric material with a dielectric constant of ε, as illustrated schematically in Fig. 1 (a). The surface of region Ω1 is denoted by Γ1. In an open-region scattering problem, the scattered field propagates to infinity, but to restrict the computational region, we introduce an artificial interface Γ0 within which the EM fields are numerically calculated by subdividing the region into small volume elements. The dielectric area between Γ0 and Γ1, denoted by Ω0, and the exterior (far-field) region, denoted by Ω, have dielectric constants of ε, and thus there is no reflection or refraction at Γ0.

 figure: Fig. 1

Fig. 1 (a) Schematic illustration of a semiconductor nanostructure (region Ω1) surrounded by a dielectric (regions Ω0 and Ω). The interface between the semiconductor nanostructure and dielectric is denoted by Γ1, and an artificial spherical surface, denoted by Γ0, is introduced within which the region is subdivided into small volume elements for the numerical computation. Various wave modes are also depicted. (b) The dispersion relations of two transverse exciton polaritons and one longitudinal exciton in bulk CuCl (the CuCl parameters for the calculation are summarized in Table 1).

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In the semiconductor region Ω1, the dielectric function including the exciton effect is expressed as

ε(k,ω)=εbg+εbgΔLTEG+(h¯2/2M)k2h¯ωih¯γ,
where EG, ΔLT, and M are the excitation energy at a band edge, longitudinal–transverse splitting energy, and exciton translation mass, respectively, εbg is the background dielectric constant, and h̄γ is the exciton damping energy. The k-dependence of the dielectric function in Eq. (1) comes from the kinetic energy of the exciton, which is responsible for the size quantization effect in the spectral peaks of semiconductor nanostructures. Because the EM field interacts with an exciton, the EM field in the semiconductor propagates as an exciton polariton. The dispersion relation of the exciton polariton in the bulk semiconductor is given by
k2=(ωc)2ε(k,ω).
By substituting Eq. (1) into Eq. (2), we obtain four complex solutions for k. Two solutions kt1 and kt2, which have a positive imaginary component, are physically meaningful wave vectors, and the two associated exciton polaritons have a transverse character. We denote the electric fields of these exciton polaritons as E(t1) and E(t2), respectively. There is also one longitudinal exciton whose dispersion is obtained from ε(kl, ω) = 0, with kl being the wave vector of the longitudinal exciton, and we denote its corresponding electric field as E(l) = −∇Φ, where Φ is a scalar potential. The dispersion relations of the two transverse exciton polaritons and the single longitudinal exciton are shown in Fig. 1(b). Note that these three modes are excited simultaneously at a given frequency because of the dispersive exciton energy.

The total electric field E(1) in region Ω1 is obtained as

E(1)=μ=12E(tμ)Φ,
while the electric field in region Ω0, denoted by E(0), consists of the incident field and the scattered fields from the semiconductor nanostructure. In region Ω, the electric field E(∞) is given by
E()=E(inc)+E(scat),
where E(scat) is the scattered field in region Ω. When we assume a spherical geometry for Γ0, as illustrated in Fig. 1, it is convenient to expand E(scat) in terms of vector spherical waves as follows:
E(scat)(r)=n=1Ncm=nn[amnMmn(r)+bmnNmn(r)],
where the integer Nc is the cut-off angular momentum, amn and bmn are expansion coefficients, and Nmn and Mmn are vector spherical harmonics (defined in the Appendix A).

We consider a plane-wave incident field given by E(inc)(r) = I0 exp(ikz) with I0 being polarized in the x-direction. The incident field can be expanded as

E(inc)=I0n=1Ncm=±1[pmnMmn(r)+qmnNmn(r)],
with
p1n=q1n=in+12n+12n(n+1),
and
p1n=q1n=in+1(n+12).

2.2. Boundary conditions

At the interface Γ1, the following Maxwell’s boundary conditions (MBCs) are satisfied:

n^1×E(0)=n^1×E(1),
n^1××E(0)=n^1××E(1)=μ=12n^1××E(tμ),
where 1 is a unit vector on Γ1 directed outward from Ω1 and normal to Γ1. When the material is a dielectric or metal, there is only one wave mode, and so the EM field is uniquely determined by imposing only the MBCs. For a semiconductor, however, there are three wave modes, i.e., two transverse exciton polaritons and one longitudinal exciton. Therefore, three more boundary conditions are necessary to determine the EM fields. Several types of ABCs have been proposed [914], and here, we use the Pekar-type ABC [9] for which the exciton polarization P(r) vanishes at the surface of the semiconductor. Since the polarization is given by P = χ(k, ω)E with χ(k, ω) = (1/4π)[ε(k, ω) − 1] being the susceptibility, the Pekar-type ABC at Γ1 is expressed as
μ=12χ(ktμ,ω)E(tμ)+χ(kl,ω)(Φ)=0.
The normal component of the ABC (11) is given by
n^1Φ=μ=12χ(ktμ,ω)χ(kl,ω)n^1E(tμ),
and the tangential component is given by
χ(kl,ω)n^1×Φ=μ=12χ(ktμ,ω)n^1×E(tμ).

At the artificial interface Γ0, the MBCs are given by

n^0×E(0)=n^0×E(),
n^0××E(0)=n^0××E()=kn=1Ncm=nn[(I0pmnδm,±1+amn)n^0×Nmn(r)+(I0qmnδm,±1+bmn)n^0×Mmn(r)],
where 0 is a unit vector on Γ0 directed outward from Ω0 and normal to Γ0. In Eq. (15), we use Eqs. (4)(6) and the relations ∇ × Nmn = kMmn and ∇ × Mmn = kNmn. Because the dielectric constants in regions Ω0 and Ω are the same, the following relation should be imposed as a boundary condition at Γ0:
E()=E(0).

2.3. Functionals

The electric field E(0) in region Ω0 obeys the following Maxwell’s wave equation:

××E(0)k2E(0)=0,
with k = ε(ω/c)2 and ω being the frequency of E(0). According to the general variation principle, a weak-form functional leading to Eq. (17) can be obtained as
0[E(0)]=12Ω0d3r{[×E(0)*][×E(0)]k2E(0)*E(0)}+12Ω0d2rE(0)*[n^0××E(0)],
where Ω0, containing Γ0 and Γ1, represents the surface area surrounding the region Ω0. The MBC [Eq. (15)] can be added to 0 by replacing [0 × ∇ × E(0)] in Eq. (18) with the expression in Eq. (15).

In region Ω1,the electric-field components E(t1) and E(t2) of the two exciton polaritons are governed by the Maxwell’s wave equation

××E(tμ)ktμ2E(tμ)=0,
whereas for the longitudinal field E(l) = −∇Φ, the potential Φ satisfies Poisson’s equation:
2Φ+kl2Φ=0.
A weak-form functional leading to Eqs. (19) and (20) is given by
1[E(t1),E(t2),Φ]=12μ=12Ω1d3r{[×E(tμ)*][×E(tμ)]ktμ2E(tμ)*E(tμ)}+12μ=12Ω1d2rE(tμ)*[n^1××E(tμ)]12Ω1d3r[(Φ*)(Φ)kl2Φ*Φ]+12Ω1d2rΦ*(n^1Φ),
where Ω1 represents the surface area surrounding the region Ω1. The ABC [Eq. (12)] can be added to 1 by substituting Eq. (12) into Eq. (21). The total functional is given by = 0 + 1.

3. Finite element analysis

To numerically calculate the solutions of the boundary-value problem, the computational region is subdivided into small volume elements as shown in Fig. 2. As we choose a tetrahedral geometry for the volume elements, the interface is subdivided into triangular elements. All the volume elements are labeled by a set of integers e = 1, 2,···, and the nodes of each volume element are labeled as i = 1, 2, 3, 4. The ith node in the eth volume element is denoted by a local label (e;i). Any node can be indicated by multiple local labels because the node belongs to multiple volume elements. For one-to-one mapping between the nodes and integers, we create a global label s(e;i) = 1, 2,··· for all nodes. The triangular element at the interface belonging to the eth volume element is denoted by fe.

 figure: Fig. 2

Fig. 2 Example of the subdivision of the mesh by tetrahedral elements.

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In the conventional FEM formalism, scalar or vector fields are assigned at the nodes of the volume elements, referred to as nodal elements. For transverse vector fields, however, a higher accuracy can be obtained if the fields are assigned at the edges of the volume elements (edge elements) [22, 23]. Here, we develop a hybrid method, i.e., the scalar field Φ is represented by nodal elements and the transverse vector fields E(α) with α = {0, t1, t2} are represented by edge elements. In more detail, Φ is expanded by the nodal-element basis L(e;i)(r):

Φ(r)=eΩ1i=14Φs(e;i)L(e;i)(r),
and E(α) is expanded by the edge-element basis W(e;ij)(r):
E(0)(r)=eΩ0ij=14Es(e;i)s(e;j)(0)W(e;ij)(r),
E(tμ)(r)=eΩ1ij=14Es(e;i)s(e;j)(tμ)W(e;ij)(r),
where L(e;i)(r) and W(e;ij)(r) are defined in the Appendix B.1.

Maxwell’s wave equations can be derived from the stationary condition of the functional , whose explicit expression is given in the Appendix B.2, with respect to Es(e;i)s(e;j)(α) and Φs(e;i). To include the MBC [Eq. (10)], we find a stationary condition

α={0,t1,t2}δδEs(e;i)s(e;j)(α)=0.[fors(e;i),s(e;j)Γ1]
In conjunction with Eq. (10), the stationary condition eliminates the contributions from the surface-integration terms including [0 × ∇ × E(0)] at Γ1 in Eq. (18) and [1 × ∇ × E(tμ)] at Γ1 in Eq. (21). Namely, we may remove beforehand the surface-integration terms in 0 and 1 and the resulting functionals are denoted by ℱ̃0 and ℱ̃1. The MBC [Eq. (10)] is included in the stationary condition [Eq. (25)] for ℱ̃ = ℱ̃0 + ℱ̃1. The explicit forms of ℱ̃0 and ℱ̃1 are given in the Appendix B.2.

The other stationary conditions are given by

δ˜δEs(e;i)s(e;j)(α)=0,[fors(e;i),s(e;j)Γ1]
δ˜δΦs(e;i)=0.
Under these three stationary conditions, the Maxwell’s wave equations are represented by linear equations with respect to Es(e;i)s(e;j)(α) and Φs(e;i). Because the procedure to obtain the linear equations is straightforward [2] and the resulting equations are complicated, the specific linear equations are not presented in this paper.

The MBC [Eq. (10)], ABC [Eq. (12)], and the MBC [Eq. (15)] are included in ℱ̃ (see the Appendix B.2). The MBC [Eq. (14)] is automatically satisfied for edge elements because the tangential electric field at the interface expresses common fields that belong to the different regions of the interface. However, this is not the case for the MBC [Eq. (9)] at the interface Γ1 because the electric field in a semiconductor area consists of E(t1), E(t2), and (−∇Φ). Therefore, we set the three variables Es(e;i)s(e;j)(t1), Es(e;i)s(e;j)(t2), and Es(e;i)s(e;j)(0) at each edge element on the interface Γ1 and explicitly impose the MBC [Eq. (9)] as follows:

Es(e;i)s(e;j)(t1)+Es(e;i)s(e;j)(t2)Φs(e;j)Φs(e;i)lij=Es(e;i)s(e;j)(0),[s(e,i),s(e,j)Γ1].
The remaining boundary conditions, Eqs. (13), and (16), are also imposed explicitly. The discretized forms of the explicit boundary condition [Eq. (13)] is given by
χ(kt1,ω)Es(e;i)s(e;j)(t1)+χ(kt2,ω)Es(e;i)s(e;j)(t2)χ(kl,ω)Φs(e;j)Φs(e;i)lij=0.[s(e,i),s(e,j)Γ1]
The explicit boundary condition in Eq. (16) is rewritten by taking the inner product of Eq. (16) with Muv* and integrating over the interface Γ0 as follows:
(I0puvδu,±1+auv)Suv(M)=e;feΓ0ij=14Es(e;i)s(e;j)(0)Γ(fe)d2rMuv*W(e;ij),
where Suv(M) is defined in the Appendix A. In a similar manner, we take the inner product of Eq. (16) with Nuv* and integrate over the interface Γ0:
(I0quvδu,±1+buv)Suv(N)=e;feΓ0ij=14Es(e;i)s(e;j)(0)Γ(fe)d2rNuv*W(e;ij),
where Suv(N) is defined in the Appendix A.

Let us check that the number of variables is equal to the number of equations. The numbers of equations defined by Eqs. (30) and (31) are equal to the numbers of variables amn and bmn, respectively, and the numbers of equations defined by Eqs. (26) and (27) are equals to the numbers of variables Es(e;i)s(e;j)(α) [s(e; i), s(e; j) ∉ Γ1] and Φs(e;i), respectively. The remaining variables are Es(e;i)s(e;j)(α) [s(e; i), s(e; j) ∈ Γ1], and the number of these variables is 3M, where M is the number of edges on Γ1. The remaining equations are explicit boundary conditions [Eqs. (28) and (29)] and the stationary condition [Eq. (25)], each of which provides M equations, and thus there are a total of 3M equations. Therefore, Es(e;i)s(e;j)(α) and Φs(n;i) can be uniquely determined.

4. Numerical results

We apply the present FEM to light scattering problems in semiconductor nanostructures. The scattering cross section σs is calculated using the expansion coefficients amn and bmn of E(scat)(r) as follows:

σs=1k2n=1Ncm=nnDmn(|amn|2+|bmn|2),
where Dmn is defined in Eq. (43) in the Appendix A.

To begin, we calculate the scattering cross section of a spherical QD. The scattering cross section for this geometry has also been calculated using Mie theory, in which the EM fields inside and outside the sphere are expanded by vector spherical harmonics and the expansion coefficients are determined from the MBCs and Pekar-type ABC [24]. The validity of the present FEM is confirmed by a comparison of the cross section with that calculated by Mie theory. We then study the scattering cross section and field distributions of a hexagonal-disk QD, which cannot be calculated using established methods.

4.1. Spherical QD

We consider a spherical QD of CuCl with a 10-nm diameter. Spherical QDs can be synthesized in a glass matrix [25], and recently, spherical CuCl QDs have been fabricated from a bulk sample using laser ablation in superfluid helium; size selective transportation of the QDs has also been reported [26]. The lowest exciton of CuCl, known as the Z3 exciton, has a simple electronic structure and a Bohr radius of 0.7 nm. Since the exciton Bohr radius is sufficiently smaller than the QD diameter, we can use the bulk exciton parameters. We take the Z3 exciton into account in the following calculations using the parameters listed in Table 1.

Tables Icon

Table 1. Parameters of the Z3 exciton of CuCl and Γ5(B) exciton of ZnO; me denotes the free electron mass.

Figure 3 (a) shows the volume element mesh in the QD region. A total of 6609 nodes and 35429 elements were used in the calculation. A sufficient cut-off angular momentum is Nc = 3. Figure 3 (b) shows the calculated scattering cross sections for an incident plane wave polarized in the x-direction using the present FEM (crosses) and Mie theory (solid line); the exciton damping energy was set to h̄γ = 1 meV. The FEM results exhibit excellent agreement with those of Mie theory, which confirms the validity of the present FEM. Figures 3 (c) and (d) show the distributions of the electric field and exciton polarization under the resonant photon energy of 3.206 eV, respectively. A strong enhanced field appears around the edge of the QD, as shown in Fig. 3 (c). This enhanced-field distribution appears in metallic nanostructures because of the surface-plasmon resonant scattering, whereas in semiconductor nanostructures, it originates from the exciton resonance. The profile of the polarization field in Fig. 3 (d) indicates that the excited state is a 1s-like nodeless exciton.

 figure: Fig. 3

Fig. 3 (a) Volume element mesh for a spherical QD. (b) Scattering cross section of a spherical QD of CuCl with a 10-nm diameter calculated by the present FEM (crosses) and by Mie theory (solid line). (c) Vector plots of the calculated electric field at the resonant photon energy indicated by the arrow in (b). (d) Vector plots of the calculated exciton polarization at the resonant photon energy indicated by the arrow in (b).

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4.2. Hexagonal-disk QD

To demonstrate the advantages of the present FEM, we consider a hexagonal-disk QD. In contrast to the spherical geometry, there are no suitable vector basis functions. Furthermore, other established numerical techniques cannot include the exciton effect for nanostructures with an arbitrary geometry. However, we show here that the present FEM is capable of calculating the light scattering from a hexagonal-disk QD of ZnO. The exciton of ZnO has a large binding energy of 60 meV, and by virtue of this fact, room-temperature laser emission from excitons in ZnO microcrystallite thin films has been realized; the hexagonal ZnO QDs were grown by laser molecular beam epitaxy [27].

Figure 4 (a) shows the volume element mesh in the QD region, and in this case, 12947 nodes, 72169 elements, and Nc = 3 were used. Figure 4 (b) shows the calculated scattering cross section for an incident plane wave propagating in the z-direction and polarized in the x-direction; the exciton damping energy was set to h̄γ = 1 meV. The electric field distributions at the resonant photon energies, indicated by the left and right arrows, are mapped in Fig. 4 (c) and Fig. 4 (f), respectively. The magnitudes of the field have been normalized to the magnitude of the incident field. Both scattered fields are enhanced by a factor of 10 at the edges of the hexagonal-disk QD near the x-axis. Although these field distributions are similar, the exciton polarization patterns are quite different, as can be seen in Fig. 4 (d) and (g) (x-component) and Fig. 4 (e) and (h) (y-component). These plots indicate that 1s-like and 2p-like excitons are excited at resonant photon energies of 3.39063 eV and 3.39227 eV, respectively. Thus, the present FEM is capable of resolving the excited modes of the excitons.

 figure: Fig. 4

Fig. 4 (a) Volume element mesh for a hexagonal-disk QD. (b) Scattering cross section calculated by the present FEM of a hexagonal-disk QD of ZnO with a length of 30 nm and a height of 10 nm. At the resonant photon energy of 3.39063 eV indicated by the left arrow in (b), (c) the magnitudes of the electric fields and the (d) x- and (e) y-components of the exciton polarization are plotted in the xy plane of the top surface of the QD. At the resonant photon energy of 3.39227 eV indicated by the right arrow in (b), (f) the magnitudes of the electric fields and the (g) x- and (h) y-components of the exciton polarization are plotted in the same plane.

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5. Conclusion

We have developed an FEM-based EM simulation method for semiconductor nanostructures with arbitrary geometries. The EM field in a semiconductor propagates as an exciton polariton with a transverse character. At a given frequency, there are at most two exciton-polariton and one longitudinal-exciton modes in the semiconductor, and thus, an ABC is necessary in addition to the MBCs for determining the EM fields. To represent the weak-form functional in terms of variables defined in subdivided volume elements, we have developed a hybrid edge–node-element method to improve the accuracy. The transverse fields and the scalar field providing the longitudinal field are represented by edge and node elements, respectively. We have found the stationary condition [Eq. (25)] from which the MBC [Eq. (10)] can be added to the derived linear equations. EM fields have been obtained by solving the equations derived from the stationary conditions [Eqs. (25)(27)] for ℱ̃ and the equations of the explicit boundary conditions [Eqs. (28)(31)].

The present method has been confirmed to be valid through a comparison with the scattering cross section of a spherical semiconductor calculated by Mie theory. Furthermore, we have applied the present FEM to the calculation of the electric-field and exciton-polarization distributions of a hexagonal-disk QD of ZnO. At each resonant photon energy, the characteristic polarization patterns reflecting the size-quantized exciton are well resolved by the calculations. We expect that the developed FEM will be a powerful tool for designing and analyzing semiconductor optical devices utilizing exciton resonance.

A. Vector spherical harmonics

An EM field in region Ω can be expanded by the basis vector functions for an outgoing wave satisfying the Maxwell’s wave equations. Since the artificial boundary Γ0 is a sphere, it is useful to represent the vector functions in spherical polar coordinates. The incident plane wave can also be expanded by the basis vector functions for the outgoing wave. These vector functions are given by

Mmn(r)=×[rΨmn(r)],
Nmn(r)=1k××[rΨmn(r)],
with
Ψmn(r)=hn(1)(kr)Pnm(cosθ)eimϕ,
where hn(1) is the nth spherical Hankel function of the first kind, and Pnm is the associated Legendre function of order n and degree m. These vector functions have a transverse character of
Mmn(r)=0,Nmn(r)=0,
and relations of
×Nmn(r)=kMmn(r),×Mmn(r)=kNmn(r).
Explicit expressions for the vector spherical harmonics are given by
Mmn(r)=imsinθhn(1)(kr)Pnm(cosθ)eimϕθ^hn(1)(kr)dPnm(cosθ)dθeimϕϕ^,
Nmn(r)=n(n+1)krhn(1)(kr)Pnm(cosθ)eimϕr^+1krξn(kr)dPnm(cosθ)dθeimϕθ^+i1krmsinθξn(kr)Pnm(cosθ)eimϕϕ^,
where ξn(x) = xhn(x) is the Ricatti–Bessel function and ξ′n(x) = (x)/dx.

The integrals of the inner product of the vector spherical harmonics on the spherical surface Γ0 of radius R are calculated as

Γ0d2rMmn*Nmn=0,
Γ0d2rMmn*Mmn=δmmδnn|hn(1)(kR)|2R2DmnSmn(M)δmmδnn,
Γ0d2rNmn*Nmn=δmmδnnR2Dmn[|ξ(kR)kR|2+n(n+1)|hn(1)(kR)|2]Smn(N)δmmδnn,
with
Dmn=4πn(n+1)2n+1(n+m)!(nm)!.

B. Hybrid-type finite element method

B.1. Basis functions

Scalar fields in the tetrahedral element are expressed by the nodal-element basis L(e;i)(r) defined as

L(e;i)(r)=a(e;i)x+a(e;i)yy+a(e;i)zz+b(e;i),
where the coefficients a(e;i)x, a(e;i)y, a(e;i)z, and b(e;i) are obtained from the condition L(e;i)[r(e;j)] = δij, with r(e;i) being the position of node (e; i).

In contrast, the vector fields are expressed by the edge-element basis W(e;ij)(r) defined as

W(e;ij)(r)=1lij[L(e;i)(r)L(e;j)(r)L(e;j)(r)L(e;i)(r)],
where lij is the length of the edge between nodes (e; i) and (e; j). Figure 5 shows the fields of the nodal- and edge-element bases.

 figure: Fig. 5

Fig. 5 Schematic illustrations of the (a) nodal-element basis L(e;i)(r) and (b) edge-element basis W(e;ij)(r).

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The expansion coefficients Φs(e;i) in Eq. (22) and Es(e;i)s(e;j)(α) in Eqs. (23) and (24) represent field amplitudes at specific points:

Φs(e;i)=Φ[r(e;i)],
Es(e;i)s(e;j)(α)=t^(e;ij)E(α)[r(e;ij)],
where (e;ij) denotes a unit vector parallel to the edge between nodes (e; i) and (e; j), and r(e;ij) = [r(e;i) + r(e;j)]/2. Note that the edge-element basis W(e;ij)(r) automatically satisfies the divergence-free condition [∇ · W(e;ij) = 0] of transverse fields [23], and thus, the transverse character of E(α) is guaranteed. This is why edge elements avoid spurious solutions and provide more accurate transverse fields than those calculated using nodal elements.

B.2. Functionals

The functional 0 in the FEM is obtained by substituting Eq. (15) into Eq. (18) and using Eq. (23) as follows:

0=12eΩ0ijkl=14Kijkl(e)(k)Es(e;i)s(e;j)(0)*Es(e;k)s(e;l)(0)+k2e;feΓ0ij=14n=1Ncm=nnEs(e;i)s(e;j)(0)*×{(I0pmnδm,±1+amn)Γ(fe)d2rW(e;ij)[n^0×Nmn(r)]fe+(I0qmnδm,±1+bmn)Γ(fe)d2rW(e;ij)[n^0×Mmn(r)]fe}+12e;feΓ1ij=14Es(e;i)s(e;j)(0)*Γ(fe)d2rW(e;ij)[n^0××E(0)]fe,
with
Kijkl(e)(k)=Ω(e)d3r{[×W(e;ij)][×W(e;kl)]k2W(e;ij)W(e;kl)},
where Ω(e) is the region of the eth volume element, Γ(fe) is the area of the interface fe, and ∑e;fe∈Γ01) denotes the summation over the volume elements e that have one triangular surface fe belonging to Γ01).

The other functional 1 is obtained by substituting Eq. (12) into Eq. (21) and using Eqs. (22) and (24) as follows:

1=12μ=12eΩ1ijkl=14Kijkl(e)(ktμ)Es(e;i)s(e;j)(tμ)*Es(e;k)s(e;l)(tμ)+12μ=12e;feΓ1ij=14Es(e;i)s(e;j)(tμ)*Γ(fe)d2rW(e;ij)[n^1××E(tμ)]fe12eΩ1ij=14Jij(e)(kl)Φs(e;i)*Φs(e;j)+12μ=12e;feΓ1ij=14χ(ktμ,ω)χ(kl,ω)Φs(e;i)*Es(e;i)s(e;j)(tμ)Γ(fe)d2rL(e;i)[n^1W(e;ij)]fe,
with
Jij(e)(kl)=Ω(e)d3r{[L(e;i)][L(e;j)]kl2L(e;i)L(e;j)}.
In the stationary condition [Eq. (25)], the terms coming from the functional derivative of the last term in Eq. (48) and the second term in Eq. (50) can be eliminated using the MBC [Eq. (10)]. Therefore, we can include the MBC [Eq. (10)] by removing these terms, i.e., we use the following functional ℱ̃0 and ℱ̃1:
˜0=12eΩ0ijkl=14Kijkl(e)(k)Es(e;i)s(e;j)(0)*Es(e;k)s(e;l)(0)+k2e;feΓ0ij=14n=1Ncm=nnEs(e;i)s(e;j)(0)*×{(I0pmnδm,±1+amn)Γ(fe)d2rW(e;ij)[n^0×Nmn(r)]fe+(I0qmnδm,±1+bmn)Γ(fe)d2rW(e;ij)[n^0×Mmn(r)]fe},
and
˜1=12μ=12eΩ1ijkl=14Kijkl(e)(ktμ)Es(e;i)s(e;j)(tμ)*Es(e;k)s(e;l)(tμ)12eΩ1ij=14Jij(e)(kl)Φs(e;i)*Φs(e;j)+12μ=12e;feΓ1ij=14χ(ktμ,ω)χ(kl,ω)Φs(e;i)*Es(e;i)s(e;j)(tμ)Γ(fe)d2rL(e;i)[n^1W(e;ij)]fe.
The total functional ℱ̃ is then given by ℱ̃ = ℱ̃0 + ℱ̃1.

Acknowledgments

The authors would like to gratefully acknowledge Gang Bao (MSU, USA) for creating opportunity to start this study and for stimulating discussions. This work was supported by Grant-in-Aid for Scientific Research (C), No. 25400325.

References and links

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Figures (5)

Fig. 1
Fig. 1 (a) Schematic illustration of a semiconductor nanostructure (region Ω1) surrounded by a dielectric (regions Ω0 and Ω). The interface between the semiconductor nanostructure and dielectric is denoted by Γ1, and an artificial spherical surface, denoted by Γ0, is introduced within which the region is subdivided into small volume elements for the numerical computation. Various wave modes are also depicted. (b) The dispersion relations of two transverse exciton polaritons and one longitudinal exciton in bulk CuCl (the CuCl parameters for the calculation are summarized in Table 1).
Fig. 2
Fig. 2 Example of the subdivision of the mesh by tetrahedral elements.
Fig. 3
Fig. 3 (a) Volume element mesh for a spherical QD. (b) Scattering cross section of a spherical QD of CuCl with a 10-nm diameter calculated by the present FEM (crosses) and by Mie theory (solid line). (c) Vector plots of the calculated electric field at the resonant photon energy indicated by the arrow in (b). (d) Vector plots of the calculated exciton polarization at the resonant photon energy indicated by the arrow in (b).
Fig. 4
Fig. 4 (a) Volume element mesh for a hexagonal-disk QD. (b) Scattering cross section calculated by the present FEM of a hexagonal-disk QD of ZnO with a length of 30 nm and a height of 10 nm. At the resonant photon energy of 3.39063 eV indicated by the left arrow in (b), (c) the magnitudes of the electric fields and the (d) x- and (e) y-components of the exciton polarization are plotted in the xy plane of the top surface of the QD. At the resonant photon energy of 3.39227 eV indicated by the right arrow in (b), (f) the magnitudes of the electric fields and the (g) x- and (h) y-components of the exciton polarization are plotted in the same plane.
Fig. 5
Fig. 5 Schematic illustrations of the (a) nodal-element basis L(e;i)(r) and (b) edge-element basis W(e;ij)(r).

Tables (1)

Tables Icon

Table 1 Parameters of the Z3 exciton of CuCl and Γ5(B) exciton of ZnO; me denotes the free electron mass.

Equations (53)

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ε ( k , ω ) = ε bg + ε bg Δ LT E G + ( h ¯ 2 / 2 M ) k 2 h ¯ ω i h ¯ γ ,
k 2 = ( ω c ) 2 ε ( k , ω ) .
E ( 1 ) = μ = 1 2 E ( t μ ) Φ ,
E ( ) = E ( inc ) + E ( scat ) ,
E ( scat ) ( r ) = n = 1 N c m = n n [ a m n M m n ( r ) + b m n N m n ( r ) ] ,
E ( inc ) = I 0 n = 1 N c m = ± 1 [ p m n M m n ( r ) + q m n N m n ( r ) ] ,
p 1 n = q 1 n = i n + 1 2 n + 1 2 n ( n + 1 ) ,
p 1 n = q 1 n = i n + 1 ( n + 1 2 ) .
n ^ 1 × E ( 0 ) = n ^ 1 × E ( 1 ) ,
n ^ 1 × × E ( 0 ) = n ^ 1 × × E ( 1 ) = μ = 1 2 n ^ 1 × × E ( t μ ) ,
μ = 1 2 χ ( k t μ , ω ) E ( t μ ) + χ ( k l , ω ) ( Φ ) = 0 .
n ^ 1 Φ = μ = 1 2 χ ( k t μ , ω ) χ ( k l , ω ) n ^ 1 E ( t μ ) ,
χ ( k l , ω ) n ^ 1 × Φ = μ = 1 2 χ ( k t μ , ω ) n ^ 1 × E ( t μ ) .
n ^ 0 × E ( 0 ) = n ^ 0 × E ( ) ,
n ^ 0 × × E ( 0 ) = n ^ 0 × × E ( ) = k n = 1 N c m = n n [ ( I 0 p m n δ m , ± 1 + a m n ) n ^ 0 × N m n ( r ) + ( I 0 q m n δ m , ± 1 + b m n ) n ^ 0 × M m n ( r ) ] ,
E ( ) = E ( 0 ) .
× × E ( 0 ) k 2 E ( 0 ) = 0 ,
0 [ E ( 0 ) ] = 1 2 Ω 0 d 3 r { [ × E ( 0 ) * ] [ × E ( 0 ) ] k 2 E ( 0 ) * E ( 0 ) } + 1 2 Ω 0 d 2 r E ( 0 ) * [ n ^ 0 × × E ( 0 ) ] ,
× × E ( t μ ) k t μ 2 E ( t μ ) = 0 ,
2 Φ + k l 2 Φ = 0 .
1 [ E ( t 1 ) , E ( t 2 ) , Φ ] = 1 2 μ = 1 2 Ω 1 d 3 r { [ × E ( t μ ) * ] [ × E ( t μ ) ] k t μ 2 E ( t μ ) * E ( t μ ) } + 1 2 μ = 1 2 Ω 1 d 2 r E ( t μ ) * [ n ^ 1 × × E ( t μ ) ] 1 2 Ω 1 d 3 r [ ( Φ * ) ( Φ ) k l 2 Φ * Φ ] + 1 2 Ω 1 d 2 r Φ * ( n ^ 1 Φ ) ,
Φ ( r ) = e Ω 1 i = 1 4 Φ s ( e ; i ) L ( e ; i ) ( r ) ,
E ( 0 ) ( r ) = e Ω 0 i j = 1 4 E s ( e ; i ) s ( e ; j ) ( 0 ) W ( e ; i j ) ( r ) ,
E ( t μ ) ( r ) = e Ω 1 i j = 1 4 E s ( e ; i ) s ( e ; j ) ( t μ ) W ( e ; i j ) ( r ) ,
α = { 0 , t 1 , t 2 } δ δ E s ( e ; i ) s ( e ; j ) ( α ) = 0 . [ for s ( e ; i ) , s ( e ; j ) Γ 1 ]
δ ˜ δ E s ( e ; i ) s ( e ; j ) ( α ) = 0 , [ for s ( e ; i ) , s ( e ; j ) Γ 1 ]
δ ˜ δ Φ s ( e ; i ) = 0 .
E s ( e ; i ) s ( e ; j ) ( t 1 ) + E s ( e ; i ) s ( e ; j ) ( t 2 ) Φ s ( e ; j ) Φ s ( e ; i ) l i j = E s ( e ; i ) s ( e ; j ) ( 0 ) , [ s ( e , i ) , s ( e , j ) Γ 1 ] .
χ ( k t 1 , ω ) E s ( e ; i ) s ( e ; j ) ( t 1 ) + χ ( k t 2 , ω ) E s ( e ; i ) s ( e ; j ) ( t 2 ) χ ( k l , ω ) Φ s ( e ; j ) Φ s ( e ; i ) l i j = 0 . [ s ( e , i ) , s ( e , j ) Γ 1 ]
( I 0 p u v δ u , ± 1 + a u v ) S u v ( M ) = e ; f e Γ 0 i j = 1 4 E s ( e ; i ) s ( e ; j ) ( 0 ) Γ ( f e ) d 2 r M u v * W ( e ; i j ) ,
( I 0 q u v δ u , ± 1 + b u v ) S u v ( N ) = e ; f e Γ 0 i j = 1 4 E s ( e ; i ) s ( e ; j ) ( 0 ) Γ ( f e ) d 2 r N u v * W ( e ; i j ) ,
σ s = 1 k 2 n = 1 N c m = n n D m n ( | a m n | 2 + | b m n | 2 ) ,
M m n ( r ) = × [ r Ψ m n ( r ) ] ,
N m n ( r ) = 1 k × × [ r Ψ m n ( r ) ] ,
Ψ m n ( r ) = h n ( 1 ) ( k r ) P n m ( cos θ ) e i m ϕ ,
M m n ( r ) = 0 , N m n ( r ) = 0 ,
× N m n ( r ) = k M m n ( r ) , × M m n ( r ) = k N m n ( r ) .
M m n ( r ) = i m sin θ h n ( 1 ) ( k r ) P n m ( cos θ ) e i m ϕ θ ^ h n ( 1 ) ( k r ) d P n m ( cos θ ) d θ e i m ϕ ϕ ^ ,
N m n ( r ) = n ( n + 1 ) k r h n ( 1 ) ( k r ) P n m ( cos θ ) e i m ϕ r ^ + 1 k r ξ n ( k r ) d P n m ( cos θ ) d θ e i m ϕ θ ^ + i 1 k r m sin θ ξ n ( k r ) P n m ( cos θ ) e i m ϕ ϕ ^ ,
Γ 0 d 2 r M m n * N m n = 0 ,
Γ 0 d 2 r M m n * M m n = δ m m δ n n | h n ( 1 ) ( k R ) | 2 R 2 D m n S m n ( M ) δ m m δ n n ,
Γ 0 d 2 r N m n * N m n = δ m m δ n n R 2 D m n [ | ξ ( k R ) k R | 2 + n ( n + 1 ) | h n ( 1 ) ( k R ) | 2 ] S m n ( N ) δ m m δ n n ,
D m n = 4 π n ( n + 1 ) 2 n + 1 ( n + m ) ! ( n m ) ! .
L ( e ; i ) ( r ) = a ( e ; i ) x + a ( e ; i ) y y + a ( e ; i ) z z + b ( e ; i ) ,
W ( e ; i j ) ( r ) = 1 l i j [ L ( e ; i ) ( r ) L ( e ; j ) ( r ) L ( e ; j ) ( r ) L ( e ; i ) ( r ) ] ,
Φ s ( e ; i ) = Φ [ r ( e ; i ) ] ,
E s ( e ; i ) s ( e ; j ) ( α ) = t ^ ( e ; i j ) E ( α ) [ r ( e ; i j ) ] ,
0 = 1 2 e Ω 0 i j k l = 1 4 K i j k l ( e ) ( k ) E s ( e ; i ) s ( e ; j ) ( 0 ) * E s ( e ; k ) s ( e ; l ) ( 0 ) + k 2 e ; f e Γ 0 i j = 1 4 n = 1 N c m = n n E s ( e ; i ) s ( e ; j ) ( 0 ) * × { ( I 0 p m n δ m , ± 1 + a m n ) Γ ( f e ) d 2 r W ( e ; i j ) [ n ^ 0 × N m n ( r ) ] f e + ( I 0 q m n δ m , ± 1 + b m n ) Γ ( f e ) d 2 r W ( e ; i j ) [ n ^ 0 × M m n ( r ) ] f e } + 1 2 e ; f e Γ 1 i j = 1 4 E s ( e ; i ) s ( e ; j ) ( 0 ) * Γ ( f e ) d 2 r W ( e ; i j ) [ n ^ 0 × × E ( 0 ) ] f e ,
K i j k l ( e ) ( k ) = Ω ( e ) d 3 r { [ × W ( e ; i j ) ] [ × W ( e ; k l ) ] k 2 W ( e ; i j ) W ( e ; k l ) } ,
1 = 1 2 μ = 1 2 e Ω 1 i j k l = 1 4 K i j k l ( e ) ( k t μ ) E s ( e ; i ) s ( e ; j ) ( t μ ) * E s ( e ; k ) s ( e ; l ) ( t μ ) + 1 2 μ = 1 2 e ; f e Γ 1 i j = 1 4 E s ( e ; i ) s ( e ; j ) ( t μ ) * Γ ( f e ) d 2 r W ( e ; i j ) [ n ^ 1 × × E ( t μ ) ] f e 1 2 e Ω 1 i j = 1 4 J i j ( e ) ( k l ) Φ s ( e ; i ) * Φ s ( e ; j ) + 1 2 μ = 1 2 e ; f e Γ 1 i j = 1 4 χ ( k t μ , ω ) χ ( k l , ω ) Φ s ( e ; i ) * E s ( e ; i ) s ( e ; j ) ( t μ ) Γ ( f e ) d 2 r L ( e ; i ) [ n ^ 1 W ( e ; i j ) ] f e ,
J i j ( e ) ( k l ) = Ω ( e ) d 3 r { [ L ( e ; i ) ] [ L ( e ; j ) ] k l 2 L ( e ; i ) L ( e ; j ) } .
˜ 0 = 1 2 e Ω 0 i j k l = 1 4 K i j k l ( e ) ( k ) E s ( e ; i ) s ( e ; j ) ( 0 ) * E s ( e ; k ) s ( e ; l ) ( 0 ) + k 2 e ; f e Γ 0 i j = 1 4 n = 1 N c m = n n E s ( e ; i ) s ( e ; j ) ( 0 ) * × { ( I 0 p m n δ m , ± 1 + a m n ) Γ ( f e ) d 2 r W ( e ; i j ) [ n ^ 0 × N m n ( r ) ] f e + ( I 0 q m n δ m , ± 1 + b m n ) Γ ( f e ) d 2 r W ( e ; i j ) [ n ^ 0 × M m n ( r ) ] f e } ,
˜ 1 = 1 2 μ = 1 2 e Ω 1 i j k l = 1 4 K i j k l ( e ) ( k t μ ) E s ( e ; i ) s ( e ; j ) ( t μ ) * E s ( e ; k ) s ( e ; l ) ( t μ ) 1 2 e Ω 1 i j = 1 4 J i j ( e ) ( k l ) Φ s ( e ; i ) * Φ s ( e ; j ) + 1 2 μ = 1 2 e ; f e Γ 1 i j = 1 4 χ ( k t μ , ω ) χ ( k l , ω ) Φ s ( e ; i ) * E s ( e ; i ) s ( e ; j ) ( t μ ) Γ ( f e ) d 2 r L ( e ; i ) [ n ^ 1 W ( e ; i j ) ] f e .
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