Abstract

This paper presents the results of experimental studies of the optical constants and growth rate of SiO2 films fabricated by the magnetron sputtering of a Si target in an Ar:O2 medium by ultrasonic-frequency current. The resulting SiO2 films are similar in optical parameters to SiO2 films fabricated by ion-assisted electron-beam evaporation. © 2004 Optical Society of America

a-Si:H/SiO₂ multilayer films fabricated by radio-frequency magnetron sputtering for optical filters

Hidehiko Yoda, Kazuo Shiraishi, Yuji Hiratani, and Osamu Hanaizumi
Appl. Opt. 43(17) 3548-3554 (2004)

AlF3 thin films deposited by reactive magnetron sputtering with Al target

Cheng-Chung Lee, Bo-Huei Liao, and Ming-Chung Liu
Opt. Express 15(15) 9152-9156 (2007)

Optical properties and residual stress in aluminum nitride films prepared by alternating-current dual reactive magnetron sputtering

Chien-Jen Tang, Cheng-Chung Jaing, Kun-Hsien Lee, and Cheng-Chung Lee
Appl. Opt. 50(13) 1945-1950 (2011)

Interfacial optical absorption in TiO₂–SiO₂ multilayer coatings prepared by rf magnetron sputtering

Tomuo Yamaguchi, Hayaki Tamura, Shiroh Taga, and Seigou Tsuchiya
Appl. Opt. 25(16) 2703-2706 (1986)

Magnetron sputter deposition of Ta₂O₅-SiO₂ quantized nanolaminates

S. Schwyn Thöny, M. Bärtschi, M. Batzer, M. Baselgia, S. Waldner, M. Steinecke, H. Badorreck, A. Wienke, and M. Jupé
Opt. Express 31(10) 15825-15835 (2023)