Abstract
Methods are described for measuring accurately the half-widths of frustrated total reflection filters (see reference 1) of very narrow pass bands, and for detecting extremely small non-uniformities in the spacer layers of these filters. The latter method, permitting observation and measurement of thin film non-uniformities appreciably less than one unit cell provides a very sensitive means of studying thin film structures and the mechanism of formation.
© 1949 Optical Society of America
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Harry D. Polster
J. Opt. Soc. Am. 39(12) 1038-1043 (1949)
Georg Hass
J. Opt. Soc. Am. 39(7) 532-540 (1949)
B. H. Billings and M. A. Pittman
J. Opt. Soc. Am. 39(12) 978-983 (1949)