Abstract
We present a replication process, named reversal soft ultraviolet (UV)
nanoimprint, to fabricate a high-aspect-ratio flexible subwavelength grating (SWG)
on a polyurethane acrylate (PUA). This nanopatterning technique consists of casting,
reversal UV imprint, and dry release. The UV curing process of PUA to avoid pattern
collapse is investigated. Revalpha film acts as the supporting and sacrificial layer
during the whole process due to its special surface energy property. The
free-standing PUA structures with a period of 200 nm and a depth of 350 nm can be
automatically released from the Revalpha film by heating. The PUA resist is well
suited to replicate fine patterns of the mold with high aspect ratio and large area
precisely and uniformly for low surface energy and low viscosity. The measured
transmittance is compared with the calculation results based on rigorous
coupled-wave analysis in the wavelength region ranging from 500 to 800 nm. The
experimental results agree well with the theoretical calculations.
© 2012 Chinese Optics Letters
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